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Program

Date
Place
  • Room H (Room Hall 1, 1F)
  • P2. Poster Session II
  • August 21, 2015 (Friday)
  • 14:00 ~ 15:30
  • [P2-97]
  • 14:00 ~ 15:30
  • Title:Ultrathin LiF/Al/Ag Layer of Cathode Electrode for Highly Transparent Organic Light-Emitting Diodes
  • Jung Hyuk Im, Kwon Yong Shin, Min Gyu Kang, Sang Ho Lee, Kyung Tae Kang, and Kwan Hyun Cho (KITECH, Korea)

  • Abstract: In this study, we report ultrathin LiF/Al/Ag layer with a Ag thickness ranging from 4~10 nm for highly transparent cathode electrode. Fig. 1 (a) shows obvious difference between the sample with Al/Ag structrues and the Ag only structures. In the Al/Ag structures, charge density oscillations confined to metallic nanoparticles disappeared. The scanning electron microscopy (SEM) images shows that the Al/Ag layer have more smooth and continuous surface morphology compared to the the Ag layer as shown in Fig. 1 (b). As well known growth mode of Volmer?Weber, the Ag thin film tend to initially form isolated islandsons on dielectric surfaces [O.V. Mazurin and E.A. Porai-Koshits (eds.), Phase Separation in Glass, North-Holland, Amsterdam, (1984).]. From the measurement of optical transmittance and SEM images, we concluded that the insertion of Al layer minimize the strong localized surface plasmon absorption, this leads the improvement of transmittance.

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